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but they are not discussed in this Guide
The resulting information may be used to assess the uniformity of the film itself or of the layer formation process
SEMI E49-0702 (technical revision)
A purchase specification may include requirements for additional physical properties as listed in this Specification
E01400 - SEMI E14 - Measurement of Particle Contamination Contributed to the Product from the Process or Support Tool StdPbc-1017 but they are not discussedNOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI Standards in 2003. The purpose of this document is to provide a standardized methodology and detailed procedure for measuring the contamination performance of a particular process or tool in terms of the number and size distribution of particles added to a silicon wafer as a result of having been passed through that process tool. Referenced SEMI Standards SEMI M10
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